Gallium nitride based III-V group compound semiconductor...

Active solid-state devices (e.g. – transistors – solid-state diode – Responsive to non-electrical signal – Electromagnetic or particle radiation

Reexamination Certificate

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C257S011000, C257S021000, C257S022000, C257S076000, C257S094000, C257S103000, C257S453000, C257S613000, C257S615000, C257S745000, C257S766000, C257S098000, C257S086000, C257S099000

Reexamination Certificate

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06998690

ABSTRACT:
A gallium nitride-based III-V Group compound semiconductor device has a gallium nitride-based III-V Group compound semiconductor layer provided over a substrate, and an ohmic electrode provided in contact with the semiconductor layer. The ohmic electrode is formed of a metallic material, and has been annealed.

REFERENCES:
patent: 4153905 (1979-05-01), Charmakadze et al.
patent: 4316208 (1982-02-01), Kobayashi et al.
patent: 4396929 (1983-08-01), Ohki et al.
patent: 4495514 (1985-01-01), Lawrence et al.
patent: 5247533 (1993-09-01), Okazaki et al.
patent: 5281830 (1994-01-01), Kotaki et al.
patent: 5285078 (1994-02-01), Mimura et al.
patent: 5369289 (1994-11-01), Tamaki et al.
patent: 5408120 (1995-04-01), Manabe et al.
patent: 5696389 (1997-12-01), Ishikawa et al.
patent: 5739552 (1998-04-01), Kimura et al.
patent: RE36747 (2000-06-01), Manabe et al.
patent: 0 483 688 (1992-05-01), None
patent: 0 483 688 (1992-05-01), None
patent: 51-85384 (1976-07-01), None
patent: 55009442 (1980-01-01), None
patent: 56-81986 (1981-07-01), None
patent: 57-45272 (1982-03-01), None
patent: 57-111076 (1982-07-01), None
patent: 228776 (1984-12-01), None
patent: 59-228776 (1984-12-01), None
patent: 59228776 (1984-12-01), None
patent: 61-87381 (1986-05-01), None
patent: 61-144659 (1986-09-01), None
patent: 62-2675 (1987-01-01), None
patent: 62-101090 (1987-05-01), None
patent: 62-287675 (1987-12-01), None
patent: 63-61161 (1988-04-01), None
patent: 2-68968 (1990-03-01), None
patent: 02-229475 (1990-09-01), None
patent: 3-183173 (1991-08-01), None
patent: 03-218625 (1991-09-01), None
patent: 4-68579 (1992-03-01), None
patent: 5-13816 (1993-01-01), None
patent: 05-013812 (1993-01-01), None
patent: 5-129658 (1993-05-01), None
patent: 5-211347 (1993-08-01), None
patent: 5-291621 (1993-11-01), None
patent: 6-38265 (1994-05-01), None
patent: 7-45867 (1995-02-01), None
patent: 1990-0701577 (1990-07-01), None
patent: 10-0225612 (1999-07-01), None
patent: 83103775 (1994-04-01), None
Oyo Buturi vol. 60, No. 2, 1991 02; p. 164.
Hayes et al Proceedings of Symposium B 1990 Extended Abstracts EA-21 Electronic Optical and Device Properties of Layered Structures.
Amano et al Japanese Journal of Applied Physics vol. 28 No. 12, 1989 L2112-L2114 P-Type Conduction in Mg-Doped GaN Treated with Low-Energy Electron Beam Irradiation (LEEBI).
Nakamura et al Jpn J. Appl. Phys. vol. 31 (1992) pp 1258-1266 Hole Compensation Mechanisms of P-Type GaN Films Dept. Of Electrical Engineering.
Su et al Jpn. J. Applied Physics vol. 30 No. 5, May 1991 914-916 Ohmic Contacts AuGeNi etc.
Amano et al Inst. Phys. Conf. Ser. No. 106: Chapter 10 pp 725-730 UV and blue electroluminescence etc.
Memoirs of the Faculty of Engineering, Nagoya University, vol. 43, No. 2, 1991 Movpe Growth of GaN etc.
Williams Modern GaAs Processing Method, 1990 p. 219.
Lin et al Appl. Phys. Lett 64(8), Feb. 1994 pp 1003-1005 Low Resistance ohmic contacts on wide band-gap GaN.
Khan et al Appl. Phys. Lett 61 (15) Apr. 1993 pp. 1786-1787Metal semiconductor field effect transistor based on single crystal GaN.
Japanese KOKAI publication list of patents containing key words “Ni” and “electrode”.
Goldenberg et al “Ultraviolet and violet light-emitting . . . ” Appl. Phys. Lett. 62 (1993), Jan. 25 No. 4, pp 381-383.
Foresi et al “Metal contacts to gallium nitride” Appl. Phys. Letts 62 (May 31, 1993 No. 22, pp. 2859-2861.
Akasaki et al “High efficiency UV . . . ” Proc. of the SPIE, Phys. Concepts of Materials . . . Oct. 28, 1990, Aachen, DE, pp 138-149.
Khan et al “Metal semiconductor field effect . . . ” Appl. Phys. Leltts 62 (15), Apr. 12, 1993, pp. 1786-1787.
Nakamura et al “High-power InGan/Gan . . . ” Appl. Phys. Letts. 62 (19) May 10, 1993 pp 2390-2392.
H. Morkoc et al “Large-band-gap SIC, . . . ” J. Phys. 76(3), Aug. 1, 1994 pp 1363-1398.
Patent Abstracts of Japan, vol. 18 No. 80 (E-1505) Feb. 9, 1994 & JP-A-05 291 621 (Nichia Chem Inc Ltd.) Nov. 5, 1993 (see abstract.
Database WPI, Week 9444, Derwent Publications Ltd. London, GB AN 94-352820 & JP A-6 275 868 (Nichia Kagaku Kogyo KK) Sep. 20, 1994, see abstract.
Database WPI, Week 9438, Derwent Publications Ltd. London GV An 94-308360 & JP A 6 237 012 (Nichia Kagaku Kogyo KK) 23 Au. 1994, see abstract.
Akasaki et al., “MOVPE Growth of GaN and AlxGa1+xN and Their Luminescence and Electrical Properties,” Memoirs of the Faculty of Engineering, Nagoya Univ., vol. 43, No. 2 (1991).
Williams Modern GaAs Processing Method (1990), p. 219.
Database WPI, Week 9444, Derwent Publications Ltd., London, Nichia Kagaku Kogyo KK (see Abstract).
JP 6275868 (Sep. 30, 1994) (see Abstract).
Written Opposition dated Jan. 15, 2001, p. 1-3.
Written Opposition dated Jan. 19, 2001, pp. 1-5.
European Search Report, Appln. EP 04012118 (Mar. 14, 2005).
Patent Abstracts of Japan, vol. 13, No. 155 (E0743), Apr. 14, 1989 & JP 63-311777 A (Dec. 20, 1988), Abstract.

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