GaAs anneal boat design and method for use

Details GaAs anneal boat design and method for use GaAs anneal boat design and method for use

1997-01-23

1998-10-06

Bueker, Richard

Coating apparatus

Gas or vapor deposition

Work support

438796, 438797, C23C 1600

Patent

active

058171797

ABSTRACT:
An improved gallium arsenide anneal boat and method for annealing comprises a slot structure for holding a wafer-stack of first and second GaAs wafers and a silicon wafer in the slot structure prior to annealing. The silicon wafer is tightly held in a central slot to maintain a vertical position and the GaAs wafers are loosely held in outside slots to avoid the formation of slip lines. The GaAs wafers slightly adhere to the silicon wafer to maintain a vertical position to avoid bending. Additionally, the wafer-stacks are separated by more than about 1.25 inches and processed in arsine gas at about 1 atm. pressure to avoid hazing.

REFERENCES:
patent: 4203940 (1980-05-01), Dietze

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