Fuse, memory incorporating same and method

Active solid-state devices (e.g. – transistors – solid-state diode – Integrated circuit structure with electrically isolated... – Passive components in ics

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438601, 438706, H01L 2900, H01L 2144

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active

061304689

ABSTRACT:
A method of making a fuse and a fuse, together with systems and integrated circuits where the fuse provides benefits, are described. A fuse comprising a conductive material is formed on a substrate. A series of dielectric layers having a composite thickness is formed on the substrate and the fuse. The series of dielectric layers serves to insulate a series of conductive layers from each other. The conductive layers are disposed above portions of the substrate. An opening is formed extending through a passivation layer and the series of dielectric layers. The opening exposes a portion of the fuse. Another dielectric layer is formed on the fuse and the fuse may thereafter be programmed by directing a laser beam onto the fuse through the opening.

REFERENCES:
patent: 5578517 (1996-11-01), Yoo et al.
patent: 5583463 (1996-12-01), Merritt
patent: 5602783 (1997-02-01), Ong
patent: 5602785 (1997-02-01), Casper
patent: 5729041 (1998-03-01), Yoo et al.
patent: 5754089 (1998-05-01), Chen et al.
patent: 5760453 (1998-06-01), Chen
patent: 5773869 (1998-06-01), Froehner
patent: 5848007 (1998-12-01), Takahashi
patent: 5879966 (1999-03-01), Lee et al.
patent: 5895962 (1999-04-01), Zheng et al.

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