Coating apparatus – Gas or vapor deposition – With treating means
Patent
1995-08-11
1997-02-18
Kunemund, Robert
Coating apparatus
Gas or vapor deposition
With treating means
118728, 118500, 118666, 219390, 219411, 392416, C23C 1100
Patent
active
056037724
ABSTRACT:
A furnace available for diffusion and oxidation is equipped with a plurality of groups of temperature sensors monitoring respective zones heated by associated heater elements, and a plurality of controller vary electric currents supplied to the heater elements so as to create a uniform temperature distribution around semiconductor wafers.
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Kunemund Robert
Lund Jeffrie R.
NEC Corporation
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