Furnace contamination

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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29574, 118664, 148 33, 148DIG7, 156DIG66, 427 8, B05D 100

Patent

active

046683305

ABSTRACT:
The invention described herein describes certain test wafers to be used in diagnosing heavy metal contamination in furnaces used in the manufacture of electronic devices and the method of referencing such wafers to a common wafer source for establishing an accurate baseline for a furnace to determine if it is functioning adequately or if an impurity or contaminant problem exists.

REFERENCES:
patent: 4220483 (1980-09-01), Cazcarra
patent: 4257825 (1981-03-01), Schaumburg
patent: 4342616 (1982-08-01), Elliot et al.
patent: 4420497 (1983-12-01), Tickle
patent: 4440799 (1984-04-01), Faith, Jr.
patent: 4473795 (1984-09-01), Wood
patent: 4538105 (1985-08-01), Ausschnitt
Walter, "Alloying Ohmic Contacts Into GaAs Structures," IBM Technical Disclosure Bulletin, vol. 14, No. 6, 11-1971, p. 1940.
Calhoun, et al., "Product Simulators for Epitaxy Test Cycles," IBM Technical Disclosure Bulletin, vol. 12, No. 8, 01-1970, pp. 1214-1215.

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