Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1997-11-12
1999-11-30
McDonald, Rodney
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419215, 20419223, 20419226, 20419228, 20419229, 20429813, C23C 1434
Patent
active
059936177
ABSTRACT:
A functional product having a transparent oxide layer and a silver layer alternately laminated on a transparent substrate in a total number of (2n+1) layers, where n.gtoreq.1, wherein an oxide film whose major component is an oxide containing tin and silicon, is formed on the outermost layer.
REFERENCES:
patent: 5110637 (1992-05-01), Ando et al.
patent: 5201926 (1993-04-01), Szczyrbowski et al.
patent: 5209835 (1993-05-01), Makino et al.
patent: 5264286 (1993-11-01), Ando et al.
J. Vossen et al, "Thin Film Processes", Academic Press, 1978, pp. 14-16.
Ando Ei'ichi
Ebisawa Junichi
Seki Hirokazu
Suzuki Koichi
Suzuki Susumu
Asahi Glass Company Ltd.
McDonald Rodney
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