Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1995-04-20
1999-08-17
Nguyen, Nam
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419212, 20419215, 20419226, 20419227, 20419228, C23C 1434
Patent
active
059388986
ABSTRACT:
A functional product comprising at least one layer of a thin film having a function formed above a substrate; and at least one layer of an oxide film whose major component is an oxide containing tin and silicon, formed above the substrate.
REFERENCES:
patent: 4978437 (1990-12-01), Wirz
patent: 5009761 (1991-04-01), Robinson
patent: 5110637 (1992-05-01), Ando et al.
patent: 5264286 (1993-11-01), Ando et al.
patent: 5399435 (1995-03-01), Ando et al.
J. Vossen et al., "Thin Film Process", Academic Press, 1978, pp. 14-16.
Ando Ei'ichi
Ebisawa Junichi
Suzuki Koichi
Suzuki Susumu
Asahi Glass Company Ltd.
Nguyen Nam
VerSteeg Steven H.
LandOfFree
Functional product does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Functional product, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Functional product will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-312030