Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – On insulating substrate or layer
Patent
1997-12-18
1999-11-09
Booth, Richard
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
On insulating substrate or layer
438489, 438300, 438295, 438218, A01L 2100
Patent
active
059813180
ABSTRACT:
A field-effect transistor structure wherein a single patterned thin film semiconductor layer: is monocrystalline, and epitaxially matched to and dielectrically isolated from an underlying body region, in channel locations; and is polycrystalline in source/drain locations which abut said channel locations.
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Booth Richard
Carlson David V.
Galanthay Theodore E.
Hack Jonathan
Jorgenson Lisa K.
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