Fresnel zone mask for pupilgram

Details Fresnel zone mask for pupilgram Fresnel zone mask for pupilgram

1998-10-23

2000-04-11

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

G03F 900

Patent

active

060486511

ABSTRACT:
A test photomask comprising a fresnel zone target (FZT) pattern may be used to verify the adjustment of a precision projector illumination system of an image projection system. The method comprises the steps of creating the FZT pattern on a photomask, projecting a pupil diagram onto an image plane using the FZT pattern, and evaluating the pupil diagram to determine the illumination system adjustment.

REFERENCES:
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patent: 4704033 (1987-11-01), Fay et al.
patent: 5667918 (1997-09-01), Brainerd et al.
Y. Borodovsky, Intel Corporation, Portland Technology Development, "Impact of Local Partial Coherence Variations on Exposure Tool Performance," SPIE Proceedings, vol. 2440 (11 pp.).
J. Kirk, C. Progler, IBM Advanced Semiconductor Technology Center, Pinholes and Pupil Fills, Microlithography World, pp. 25-28 (Autumn 1997).
J. M. Lavine, M.T. Mason, and D. R. Beaulieu, GCA Corporation, IC Systems Group, "The Effect of Semiconductor Processing Upon the Focusing Properties of Fresnel Zone Plates Used as Alignment Targets," SPIE vol. 470 Optical Microlithography III: Technology for the Next Decade (1984), pp. 122-129.

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