Frame-supported pellicle for photolithography

Details Frame-supported pellicle for photolithography Frame-supported pellicle for photolithography

1993-08-06

1995-01-03

Thomas, Alexander S.

Stock material or miscellaneous articles

Display in frame or transparent casing; or diorama including...

Peripheral enclosure or frame

428421, 428422, 156322, 156344, B32B 300

Patent

active

053785142

ABSTRACT:
Proposed is a novel frame-supported pellicle for dust-proof protection of a photomask used in the photolithographic patterning work in the manufacture of semiconductor devices and the like. The frame-supported pellicle of the invention consists of a pellicle membrane made from a specific fluorocarbon-containing polymer which is adhesively bonded in a slack-free fashion to a surface of a rigid pellicle frame by means of a hot-melt adhesive which is a fluorocarbon-containing polymer of the same type as or similar to the fluorocarbon-containing polymer of the membrane so that no problems are involved in the adhesive bonding relative to the compatibility between the adhesive and the membrane which otherwise is poorly susceptible to adhesive bonding.

REFERENCES:
patent: 5061024 (1991-10-01), Keys

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