Frame-supported pellicle for dustproof protection of photomask

Details Frame-supported pellicle for dustproof protection of photomask Frame-supported pellicle for dustproof protection of photomask

1994-07-06

1995-11-28

Thomas, Alexander S.

Stock material or miscellaneous articles

Display in frame or transparent casing; or diorama including...

Peripheral enclosure or frame

355122, B32B 300

Patent

active

054706211

ABSTRACT:
An improvement is proposed for a frame-supported pellicle for dustproof protection of a photomask, which consists of a rigid frame and a transparent plastic membrane adhesively bonded to one end surface of the frame in a slack-free fashion, used in the photolithographic patterning work for the manufacture of fine electronic parts and devices. The improvement is obtained by coating the whole surface of the pellicle frame with a coating composition by the method of electrodeposition so as to completely solve the heretofore unavoidable problem by the dust particle deposition on the pellicle membrane during transportation and handling.

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