Frame-supported pellicle for dustproof protection of photomask

Details Frame-supported pellicle for dustproof protection of photomask Frame-supported pellicle for dustproof protection of photomask

1994-09-22

1997-04-01

Berman, Jack I.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

378 35, 355 53, G21K 500

Patent

active

056169272

ABSTRACT:
Proposed is an improved frame-supported pellicle, which is an integral body consisting of a rigid frame, a transparent plastic resin film adhesively bonded to one end surface of the frame in a slack-free fashion and a layer of a pressure-sensitive adhesive on the other end surface of the frame. The improvement consists in the use of a specific pressure-sensitive adhesive capable of being imparted with a greatly decreased bonding strength when it is heated at a temperature higher than a critical temperature or irradiated with UV light in a dose exceeding a critical dose so as to facilitate demounting of the frame-supported pellicle from a photomask on which the pellicle is mounted when it is to be replaced with a new pellicle without leaving any fragments of the adhesive adherent to the photomask surface.

REFERENCES:
patent: 5012500 (1991-04-01), Watanabe et al.

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