Stock material or miscellaneous articles – All metal or with adjacent metals – Composite; i.e. – plural – adjacent – spatially distinct metal...
Patent
1994-08-09
1995-05-30
Zimmerman, John
Stock material or miscellaneous articles
All metal or with adjacent metals
Composite; i.e., plural, adjacent, spatially distinct metal...
428651, 428652, 428654, 428650, G03B 2758
Patent
active
054199727
ABSTRACT:
An improvement is proposed for a frame-supported pellicle for dustproof protection of a photomask, which consists of a rigid frame and a transparent plastic membrane adhesively bonded to one end surface of the frame in a slack-free fashion, used in the photolithographic patterning work for the manufacture of fine electronic parts and devices. The improvement is obtained by providing the whole surface of the pellicle frame made from an alluminum alloy with a metallic plating layer of nickel or chromium so as to completely solve the heretofore unavoidable problem by the dust particle deposition on the pellicle membrane during transportation and handling as a consequence of dust particle formation by contacting with the inner surface of the holder case by virtue of the extremely high smoothness of the metal-plated frame surface.
REFERENCES:
patent: 4443098 (1982-04-01), Walwyn et al.
patent: 5286567 (1994-02-01), Kubota et al.
patent: 5300348 (1994-04-01), Kubota et al.
patent: 5311250 (1994-05-01), Suzuki et al.
patent: 5327808 (1994-07-01), Nagata et al.
Hamada Yuichi
Kashida Meguru
Kawaguchi Sakae
Kubota Yoshihiro
Nagata Yoshihiko
Gray Linda L.
Shin-Etsu Chemical Co. , Ltd.
Zimmerman John
LandOfFree
Frame-supported pellicle for dustproof protection of photomask does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Frame-supported pellicle for dustproof protection of photomask, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Frame-supported pellicle for dustproof protection of photomask will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-360425