Fractionation of phenol formaldehyde condensate and photoresist

Details Fractionation of phenol formaldehyde condensate and photoresist Fractionation of phenol formaldehyde condensate and photoresist

1998-03-25

1999-11-02

Chu, John S.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

210661, 210681, 210683, 210685, 210686, 210688, 528129, 528139, 528144, 528155, 528165, 430326, G03F 7004, C08J 300

Patent

active

059767618

ABSTRACT:
A process for producing a water insoluble, aqueous alkali soluble, film forming novolak resin having low metal ions, made by the fractionation of a phenol formaldehyde condensation product, a process for producing a resin a photoresist composition of superior quality containing such novolak resin, and a method for producing a semiconductor device using such photoresist composition.

REFERENCES:
patent: 3106465 (1963-10-01), Neugebauer et al.
patent: 4033909 (1977-07-01), Papa
patent: 4719167 (1988-01-01), Miura et al.
patent: 5378802 (1995-01-01), Honda
patent: 5521052 (1996-05-01), Rahman et al.
patent: 5693749 (1997-12-01), Rahman et al.
Chemistry & Application of Phenolic Resins, A. Knap & W. Scheib, Springer Verlag, New York 1979, Chapter 4.
Light Sensitive Systems, J. Kosar, John Wiley & Sons, New York 1965, Chapter 7.4.

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