Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1997-09-29
1999-07-27
Baxter, Janet
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430311, 430905, 430168, 525491, 528144, 528501, 528203, G03C 172
Patent
active
059288361
ABSTRACT:
The present invention provides a method for producing a film forming, fractionated novolak resin copolymer exhibiting fast photospeed and superior performance in a photoresist composition. A method is also provided for producing photoresist composition from such a fractionated novolak resin copolymer and for producing semiconductor devices using such a photoresist composition.
REFERENCES:
patent: 4345054 (1982-08-01), Takeda et al.
patent: 4876324 (1989-10-01), Nakano et al.
patent: 5130410 (1992-07-01), Zampini et al.
patent: 5665517 (1997-09-01), Rahman et al.
Cook Michelle M.
Dixit Sunit S.
McKenzie Douglas S.
Rahman M. Dalil
Wanat Stanley F.
Baxter Janet
Clariant Finance (BVI) Limited
Clarke Yvette M.
Sayko Jr. Andrew F.
LandOfFree
Fractionated novolak resin copolymer and photoresist composition does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Fractionated novolak resin copolymer and photoresist composition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Fractionated novolak resin copolymer and photoresist composition will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-877122