Fractionated novolak resin and photoresist composition therefrom

Details Fractionated novolak resin and photoresist composition therefrom Fractionated novolak resin and photoresist composition therefrom

1996-12-18

1998-12-29

Baxter, Janet C.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430311, 430326, G03C 500

Patent

active

058539549

ABSTRACT:
The present invention provides a method for producing a film forming, fractionated novolak resin having consistent molecular weight and superior performance in photoresist composition, by isolating such novolak resin fractions without high temperature distillation. A method is also provided for producing photoresist composition from such a fractionated novolak resin and for producing semiconductor devices using such a photoresist composition.

REFERENCES:
patent: 5340686 (1994-08-01), Sakaguchi et al.
patent: 5494785 (1996-02-01), Sizensky et al.
patent: 5739265 (1998-04-01), Rahman et al.
Gozdz, A.S. et al. "tert-butoxycarbonylated novolacs as chemically amplified dual-tone resists", Polymer 1992, 33(21), 4653-4655.
Alger, M.S., Polymer Science Dictionary, 1990, Elsevier, New York NY, pp. 172-173.

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