Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1997-12-15
2000-04-04
Baxter, Janet
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430311, 528155, 528165, G03C 500
Patent
active
060459662
ABSTRACT:
The present invention provides a method for producing a film forming, fractionated novolak resin having consistent molecular weight and superior performance in photoresist composition, by isolating such a novolak resin fraction. A method is also provided for producing photoresist composition from such a fractionated novolak resin and for producing semiconductor devices using such a photoresist composition.
REFERENCES:
patent: 5736292 (1998-04-01), Ida et al.
patent: 5853954 (1998-12-01), Rahman et al.
Cook Michelle
Lu Ping-Hung
Rahman M. Dalil
Baxter Janet
Clariant Finance (BVI) Limited
Gilmore Barbara
Sayko Jr. Andrew F.
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