Forming a thin film electric cooler and structures formed...

Active solid-state devices (e.g. – transistors – solid-state diode – Responsive to non-electrical signal – Magnetic field

Reexamination Certificate

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C257S930000, C257SE27008, C136S203000

Reexamination Certificate

active

07902617

ABSTRACT:
Methods of forming a microelectronic structure are described. Embodiments of those methods include forming a first plurality of openings through a first surface of a substrate, forming a p-type TFTEC material within the first plurality of openings, forming a second plurality of openings substantially adjacent to the first plurality of openings through the first surface of the substrate, and then forming an n-type TFTEC material within the second plurality of openings.

REFERENCES:
patent: 6127619 (2000-10-01), Xi et al.

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