Forming a semiconductor device feature using acquired...

Semiconductor device manufacturing: process – With measuring or testing – Electrical characteristic sensed

Reexamination Certificate

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Reexamination Certificate

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07081369

ABSTRACT:
In one embodiment of the present invention, a method includes acquiring parameters for a desired feature of a semiconductor device; determining a data array using the parameters; and forming the desired feature using the data array. The desired feature in one embodiment may be a backside trench.

REFERENCES:
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patent: 5936304 (1999-08-01), Lii et al.
patent: 6245587 (2001-06-01), Vallett
patent: 6432798 (2002-08-01), Liu et al.
patent: 6509276 (2003-01-01), Scott
patent: 6592728 (2003-07-01), Paranjpe et al.
patent: 6633831 (2003-10-01), Nikoonahad et al.
Disclosure Of Information Pursuant To M.P.E.P. §§ Apr. 2001 and Jun. 2001.

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