Forming a diamond material layer on an electron emitter using hy

Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma

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427 78, 427122, 427249, 427284, 423446, B05D 306, B05D 512, C23C 1600, B01J 306

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active

052906108

ABSTRACT:
Depositing a diamond film on an electron emitting tip including disposing hydrocarbon and etchant reactant gasses together with the tip in a reaction vessel and providing an external voltage source such that electrons, emitted from the electron emitter, disassociate hydrocarbon constituents of the reactant gas. The constituents accelerate toward and are deposited onto the tip and are selectively etched by the etchant constituents such that only the diamond form of the deposited carbon remains.

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