Formation of masks/reticles having dummy features

Details Formation of masks/reticles having dummy features Formation of masks/reticles having dummy features

2007-02-12

2010-06-15

Do, Thuan (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C716S030000, C716S030000

Reexamination Certificate

active

07739648

ABSTRACT:
Structures and methods for forming the same. The method includes providing design information of a design layer. The design layer includes M original design features and N original dummy features. The method further includes (i) creating a cluster of P representative dummy features, P being a positive integer less than N, (ii) performing OPC for the cluster of the P representative dummy features but not for the N original dummy features, resulting in P OPC-applied representative dummy features, and (iii) forming the mask including N mask dummy features. The N mask dummy features are identical. Each mask dummy feature of the N mask dummy features of the mask has an area which is a function of at least an area of an OPC-applied representative dummy feature of the P OPC-applied representative dummy features. The N mask dummy features have the same relative positions as the N original dummy features.

REFERENCES:
patent: 6258489 (2001-07-01), Stanton et al.
patent: 6692875 (2004-02-01), Fischer et al.
patent: 7014955 (2006-03-01), Chang et al.
patent: 7039889 (2006-05-01), Takahashi et al.
patent: 2002/0116686 (2002-08-01), Shin et al.
patent: 2004/0063038 (2004-04-01), Shin et al.
patent: 2004/0107412 (2004-06-01), Pack et al.
patent: 2004/0256712 (2004-12-01), Ozawa et al.
patent: 2005/0076320 (2005-04-01), Maeda
patent: 2005/0139575 (2005-06-01), Lee
patent: 2005/0205961 (2005-09-01), Doong
patent: 2005/0250330 (2005-11-01), Chen et al.
PCT International Search Report and the Written Opinion of the International Searching Authority; Date of Mailing Jul. 25, 2008; Applicant's file reference BUR920060138; International application No. PCT/US 08/53694; International filing date Feb. 12, 2008; 3 pages.

Affiliated with

Also associated with

Rating

Formation of masks/reticles having dummy features does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Formation of masks/reticles having dummy features, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Formation of masks/reticles having dummy features will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4163966