Formation of a multi-nozzle ink jet

Details Formation of a multi-nozzle ink jet Formation of a multi-nozzle ink jet

1982-04-05

1984-06-19

Massie, Jerome W.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156644, 156647, 156657, 156662, H01L 21308

Patent

active

044551924

ABSTRACT:
A method for the formation of a multi-nozzle ink jet is herein disclosed. In this method a single crystal silicon plate is masked and impurities are diffused upon its surface, creating regions of echant resistance. A second single crystal silicon plate is then grown onto the first, and is masked and etched. Due to the unisotropic etching properties of single crystal silicon plates, a groove is formed in the second plate, and a plurality of nozzles is formed in the first plate. This process yields a multi-nozzle ink jet of greater overall strength and utility, while eliminating the waste due to etching run common in the manufacture of conventional ink jets.

REFERENCES:
patent: 3921916 (1975-11-01), Bassous
patent: 4256532 (1981-03-01), Magdo et al.
patent: 4282533 (1981-08-01), Brooks et al.
patent: 4381341 (1983-04-01), Przybysz
patent: 4417946 (1983-11-01), Bohlen et al.
Bassous, "High Density . . . Silicon", IBM Technical Disclosure Bulletin, vol. 19, No. 6, (11/76), pp. 2251-2252.
Chiou et al., "Ink Jet Nozzles", IBM Technical Disclosure Bulletin, vol. 19, No. 9, (2/77), p. 3569.

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