Optical: systems and elements – Mirror – Including specified control or retention of the shape of a...
Reexamination Certificate
2005-01-18
2005-01-18
Sikder, Mohammad (Department: 2872)
Optical: systems and elements
Mirror
Including specified control or retention of the shape of a...
C359S847000, C359S848000, C359S849000, C359S896000
Reexamination Certificate
active
06843572
ABSTRACT:
Methods and apparatus are disclosed for peripherally supporting X-ray-reflective mirrors such as used in X-ray microlithography systems and other X-ray optical systems. The methods provide effective physical support while reducing certain deformations in the reflective surface of the mirror. An embodiment of the method or mirror-support apparatus utilizes multiple “pushing” and “pushing” devices that apply a compressive stress and tensile stress, respectively, to respective locations on the peripheral-side surface of the mirror. One or more pushing devices and one or more pulling devices can be used as required. For example, at time of mirror fabrication, respective pushing devices can be placed adjacent concave-deviation regions and respective pulling devices can be placed adjacent convex-deviation regions on the reflective surface of the mirror. (Each pushing device produces an offsetting convexity in the adjacent mirror material, and each pulling device produces a corresponding concavity in the adjacent mirror material.) Thus, form errors arising at fabrication time are offset while simultaneously supporting the mirror.
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U.S. patent application Ser. No. 10/128,963, Shiraishi, filed Apr. 23, 2002.
Klarquist & Sparkman, LLP
Nikon Corporation
Sikder Mohammad
LandOfFree
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