Focused photon energy heating chamber

Details Focused photon energy heating chamber Focused photon energy heating chamber

2005-03-01

2005-03-01

Fuqua, Shawntina (Department: 3742)

Electric resistance heating devices

Heating devices

Radiant heater

C392S418000, C219S390000, C219S405000, C219S411000, C118S724000, C118S725000, C118S050100

Reexamination Certificate

active

06862404

ABSTRACT:
An apparatus and method for heating substrates, such as semiconductor wafers. A radiation energy source is arranged proximate to a reflector to direct radiation towards a window providing optical access to a processing chamber. A lens positioned outside of the window focuses the radiation emitted from the radiation energy source and reflector and directs it through the window. The focused radiation energy can be used to directly or indirectly heat a semiconductor wafer disposed the processing chamber.

REFERENCES:
patent: 4023904 (1977-05-01), Sheets
patent: 4989544 (1991-02-01), Yoshikawa
patent: 6437290 (2002-08-01), Shao et al.
patent: 6717158 (2004-04-01), Gat et al.

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