Focused ion beam apparatus and aperture

Details Focused ion beam apparatus and aperture Focused ion beam apparatus and aperture

2007-03-13

2007-03-13

Wells, Nikita (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S492210, C250S3960ML

Reexamination Certificate

active

11205086

ABSTRACT:
In an aperture for use in an ion beam optical system having its surface coated with a liquid metal, instability of an ion source attributable to sputtering and re-deposition of an aperture base material is prevented. A focused ion beam apparatus using a liquid metal ion source has an aperture for limiting an ion beam diameter. The aperture has a vessel formed with a recess having, at its surface lowermost point, an aperture hole through which the ion beam passes and a liquid metal mounted on the recess, the liquid metal being used for the liquid metal ion source. Preferably, the aperture may be minimized in area of aperture entrance hole inner surface which exposes the base material by tapering an aperture hole portion, by which the ion beam passes, on the downstream side.

REFERENCES:
patent: 6331712 (2001-12-01), Sugiyama et al.
patent: 6414307 (2002-07-01), Gerlach et al.
patent: 2005/0178980 (2005-08-01), Skidmore et al.
patent: 2006/0054840 (2006-03-01), Madokoro et al.
patent: 5-159730 (1993-06-01), None
patent: 3190395 (2001-05-01), None
patent: 2001-160369 (2001-06-01), None

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