Focused ION beam apparatus

Details Focused ION beam apparatus Focused ION beam apparatus

2007-07-05

2010-02-23

Wells, Nikita (Department: 2881)

Radiant energy

Ion generation

Field ionization type

C250S430000, C250S492210, C250S492300, C313S363100, C315S111310, C315S111810

Reexamination Certificate

active

07667209

ABSTRACT:
It is an object of the present invention to provide a focused ion beam apparatus capable of prolonging a service life of an aperture, preventing contaminants from increasing when a column valve is closed, and being quickly restarted.A high-voltage power supply controller lowers an extraction voltage applied to an extraction electrode or lowers a control voltage applied to a control electrode to set an emission to 0 μA when a column valve is closed. The high-voltage power supply controller returns the extraction voltage applied to the extraction electrode to an original extraction voltage or returns the control voltage applied to the control electrode to an original control voltage when a column valve is opened.

REFERENCES:
patent: 4609809 (1986-09-01), Yamaguchi et al.
patent: 5825035 (1998-10-01), Mizumura et al.
patent: 6459082 (2002-10-01), Sakaguchi
patent: 7189982 (2007-03-01), Madokoro et al.
patent: 10-162769 (1998-06-01), None

Affiliated with

Also associated with

Rating

Focused ION beam apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Focused ION beam apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Focused ION beam apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4158972