Focus test mask for projection exposure system, focus monitoring

Details Focus test mask for projection exposure system, focus monitoring Focus test mask for projection exposure system, focus monitoring

1998-12-16

2000-07-11

Font, Frank G.

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

250548, 355 53, 355 77, 356372, G01N 2186, G01B 2748

Patent

active

060881135

ABSTRACT:
A focus test mask for a projection exposure system, a focus monitoring system using the same, and a focus monitoring method include a transparent substrate and a focus test pattern formed on the substrate. The focus test pattern includes a first light shielding pattern and a second light shielding pattern placed inside the first light shielding pattern. Both light shielding patterns have fine protruding patterns arranged along edges of respective first and second closed geometric shapes defining the light shielding patterns. The focus test pattern projected onto the surface of the object allows quantitative measurement of the optimal focuses of the projection exposure system. By using the focus test mask for a projection exposure system, the optimal focuses of the projection exposure system can be periodically measured easily and precisely.

REFERENCES:
patent: 4908656 (1990-03-01), Suwa et al.
patent: 5300786 (1994-04-01), Brunner et al.
patent: 5952132 (1999-09-01), King et al.

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