Focus ring, plasma etching apparatus and plasma etching method

Details Focus ring, plasma etching apparatus and plasma etching method Focus ring, plasma etching apparatus and plasma etching method

2005-11-10

2009-11-17

Vinh, Lan (Department: 1792)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With mechanical mask, shield or shutter for shielding workpiece

C156S345510, C438S729000

Reexamination Certificate

active

07618515

ABSTRACT:
In a plasma etching apparatus for performing a plasma etching on a surface of a substrate mounted on a susceptor in a processing vessel, a focus ring is installed to surround the substrate and has a first region at an inner side on a surface thereof, in which an average surface roughness is small such that a reaction product produced during an etching processing is not captured to be deposited, and a second region at an outer side from the first region, in which an average surface roughness is large such that a reaction product produced during the etching process is captured to be deposited. A boundary between the first and the second region is a part where an etching amount is relatively significantly changed compared to other parts while the focus ring is equipped in the plasma etching apparatus and the plasma etching is performed on the substrate.

REFERENCES:
patent: 6447937 (2002-09-01), Murakawa et al.
patent: 2003/0024642 (2003-02-01), Suzuki et al.
patent: 11-135489 (1999-05-01), None

Affiliated with

Also associated with

Rating

Focus ring, plasma etching apparatus and plasma etching method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Focus ring, plasma etching apparatus and plasma etching method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Focus ring, plasma etching apparatus and plasma etching method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4058478