Focus monitor for alternating phase shifted masks

Details Focus monitor for alternating phase shifted masks Focus monitor for alternating phase shifted masks

1998-08-03

1999-08-10

Font, Frank G.

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

356376, 356356, G01B 1100

Patent

active

059367385

ABSTRACT:
A focus monitor for establishing best focus of a lithographic system in semiconductor wafers. The focus monitor has a phase region having a first phase and a slot disposed within the phase region having a gap size indicative of a defocus level of the lithographic system.

REFERENCES:
patent: 4631416 (1986-12-01), Trutna, Jr.
patent: 4664524 (1987-05-01), Hattori et al.
patent: 5300786 (1994-04-01), Brunner et al.
William H. Arnold, "A Focus Vernier For Optical Lithography," Proc. SPIE, vol. 1926, Mar. 2-4, 1993, pp. 380-392.
H. Ohtsuka et al., "Conjugate Twin-Shifter for the New Phase Shift Method to High Resolution Lithography," Proc. SPIE, vol. 1463, 1991, pp. 112-123.

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