Flush system for dry film photoresist remover

Details Flush system for dry film photoresist remover Flush system for dry film photoresist remover

2005-07-19

2005-07-19

Markoff, Alexander (Department: 1746)

Cleaning and liquid contact with solids

Processes

Hollow work, internal surface treatment

C134S010000, C134S022110, C134S022120, C134S104100, C134S111000

Reexamination Certificate

active

06918397

ABSTRACT:
A flush system comprising a network of conduits, valves and screens that can be interposed between the process container and solvent re-claim tank components of a dry film photoresist (DFR) remover system, for example, that is used in the processing and packaging of integrated circuit chips. By operation of the valves in the flush system, DFR particles can be removed from the DFR remover system in order to prevent or minimize particle clogging of a particle filter in the DFR remover system. The screens in the flush system can be periodically cleaned by reverse flow of solvent or by operation of a nitrogen and DI (deionized) water purge system.

REFERENCES:
patent: 3911938 (1975-10-01), Wiltrout
patent: 4029114 (1977-06-01), Wiltrout
patent: 6589358 (2003-07-01), Suehiro

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