Fluoropolymer interlayer dielectric by chemical vapor...

Details Fluoropolymer interlayer dielectric by chemical vapor... Fluoropolymer interlayer dielectric by chemical vapor...

2005-02-15

2005-02-15

Talbot, Brian K. (Department: 1762)

Coating processes

Coating by vapor, gas, or smoke

Organic coating applied by vapor, gas, or smoke

C427S099300, C427S255280, C427S490000, C427S497000

Reexamination Certificate

active

06855370

ABSTRACT:
A process is disclosed for forming a fluoropolymer layer on a thin film device, comprising contacting said thin film device with a gas phase fluoromonomer, and initiating polymerization of said fluoromonomer with a free radical polymerization initiator whereby said fluoromonomer polymerizes to form said fluoropolymer layer on said thin film device.

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patent: 6632470 (2003-10-01), Morra et al.
patent: 08255341 (1996-10-01), None
RD 347001, Mar., 1993.

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