Fluorometric method for increasing the efficiency of the rinsing

Details Fluorometric method for increasing the efficiency of the rinsing Fluorometric method for increasing the efficiency of the rinsing

1997-09-16

1999-07-13

Ludlow, Jan

Chemistry: analytical and immunological testing

Condition responsive control

134 13, 134 2, 134 18, 436 56, 436172, 438 5, 438 14, 438 16, 438906, G01N 2164

Patent

active

059226064

ABSTRACT:
A method for determining wafer cleanliness by fluorometric monitoring of the impurities in the semiconductor chip wafer rinse solution. A clean chip is indicated by a leveling off of increased concentration of impurities as the rinsing of the chip progresses. A method for optimizing reuse or recyling of the water discharged from the rinse process which accurately measures the contaminants in that water.

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Webster's Ninth New Collegiate Dictionary, Merriam-Webster (New York) 1987 p. 1017.
"An Analysis of Particle Adhesion on Semiconductor Surfaces" R. A. Bowling, J. Electrochem. Soc., Sep. 1985, 2208-2214.
"Cleaning Techniques for Wafer Surfaces", K. Skidmore, Semiconductor International/81-85, Aug. 1987.

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