Fluorine plasma resist image hardening

Details Fluorine plasma resist image hardening Fluorine plasma resist image hardening

1978-08-24

1980-02-05

Newsome, John H.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Post imaging radiant energy exposure

427385R, 427 41, 430330, 430317, B05D 306

Patent

active

041873319

ABSTRACT:
An organic polymer resist image layer, formed on a substrate, is stabilized by placing the substrate with the resist image layer in an electrodeless glow discharge in a low pressure fluorine containing atmosphere, for example, CF.sub.4, so as to harden the exposed surface of the layer and then heating the layer.

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patent: 4018945 (1977-04-01), Mehalso
patent: 4068018 (1978-01-01), Hashimoto et al.
patent: 4125650 (1978-11-01), Chiu et al.
IBM TDB V19, No. 3, p. 859, Aug. 1976; V14, No. 10, p. 2899, Mar. 1972; V17, No. 1, p. 85, Jun. 1974; V19, No. 4, p. 1400, Sep. 1976; V21, No. 7, p. 2824, Dec. 1978.
Bersin, "Adhesives Age," Mar. 1972, pp. 37-40.
Yasuda, "Journ. Polymer Sci.," Polymer Chem. Ed., vol. 15, pp. 2411-2425, 1977.

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