Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Reexamination Certificate
2006-06-21
2008-10-14
Hamilton, Cynthia (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
C430S313000, C430S318000, C430S323000, C430S273100
Reexamination Certificate
active
07435537
ABSTRACT:
The present invention discloses a composition suitable for use as a top antireflective coating and barrier layer for 193 nm lithography. The inventive composition is soluble in aqueous base solutions and has low refractive index at 193 nm. The inventive composition comprises an aqueous base-soluble polymer having a backbone and a fluorinated half ester moiety. The fluorinated half ester moiety is pendant from the backbone. The present invention also discloses a method of forming a patterned layer on a substrate by using the inventive composition in lithography.
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Huang Wu-Song S.
Li Wenjie
Varanasi Pushkara R.
Capella, Esq. Steven
Hamilton Cynthia
International Business Machines - Corporation
Scully , Scott, Murphy & Presser, P.C.
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