Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2006-07-06
2009-12-29
Lee, Sin J. (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S325000, C430S326000, C430S905000, C430S907000, C549S214000, C549S356000, C549S357000, C549S369000, C549S416000, C549S417000, C549S423000, C549S427000, C549S428000, C549S429000, C549S475000, C549S476000, C549S497000, C549S502000, C549S504000
Reexamination Certificate
active
07638256
ABSTRACT:
Silicon compounds having fluorinated hemiacetal structure are provided. Silicone resins having the same structure have an appropriate acidity to enable formation of a finer pattern by minimizing the pattern collapse by swelling, exhibit improved resistance to the etching used in the pattern transfer to an organic film, and are thus suited for use in resist compositions for the bilayer process.
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Hamada Yoshitaka
Kinsho Takeshi
Nakashima Mutsuo
Watanabe Takeru
Lee Sin J.
Shin-Etsu Chemical Co. , Ltd.
Westerman Hattori Daniels & Adrian LLP
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