Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1984-10-31
1986-10-21
Kittle, John E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430311, 430270, 526284, 526280, 522159, G03C 171, G03C 176, C08F 800
Patent
active
046185666
ABSTRACT:
Polymers of fluorene containing compounds which form crosslinked networks are found to provide useful negative photoresists which are sensitive in the ultraviolet wavelength range of between about 200 nm to 300 nm. When used in negative photoresist compositions, these fluorene compounds produce a high resolution and thus higher information density in microcircuits manufactured using these photoresists.
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patent: 4098984 (1978-07-01), Turner
E. Gipstein et al., Polymer Letters, 9, 671, (1971).
E. J. Greenhow, E. N. White, D. McNeil, J. Chem. Soc., 2848, (1951).
E. J. Greenhow, E. N. White, D. McNeil, J. Chem. Soc., 986, (1952).
Guillet James E.
Redpath Anthony E.
Ecoplastics Limited
Friedenson Jay P.
Hamilton Cynthia
Henry Patrick L.
Kittle John E.
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