Fluid flow control method and apparatus for an ion implanter

Details Fluid flow control method and apparatus for an ion implanter Fluid flow control method and apparatus for an ion implanter

1992-12-22

1994-05-03

Berman, Jack I.

Radiant energy

Inspection of solids or liquids by charged particles

Analyte supports

25049221, 414217, 414220, 414221, H01J 3718

Patent

active

053089898

ABSTRACT:
A fluid flow control for use with a process chamber. In the disclosed embodiment, the process chamber is for ion implantation of a workpiece such as a silicon wafer and the fluid flow control is to assure the flow rates are maintained at values which are efficient in evacuating and pressurizing the chamber do not dislodge particulate contaminants from the process chamber walls. In the disclosed design, wafers are inserted into the chamber by use of a loadlock which avoids the requirement that the process chamber be cyclicly pressurized and depressurized. A diffuser plate intercepts fluid flowing into and out of the process chamber.

REFERENCES:
patent: 4987933 (1991-01-01), Mack
patent: 5013384 (1991-05-01), Mellink et al.
patent: 5145303 (1992-09-01), Clarke
Design considerations for low particulates in Varian implantation equipment, McKenna date unknown.

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