Fluid dispensing device for wet chemical process tank and method

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

1341001, 134902, 222195, 239418, 239566, 216 92, 438748, B05C 100

Patent

active

058688986

ABSTRACT:
A wet chemical process tank for processing semiconductor wafers equipped with a specially designed fluid dispenser positioned at the bottom of the tank where the dispenser has a fluid dispensing member having an elongated body connected on at least one end to at least one support member for stabilizing the member and a fluid passage therein in fluid communication with a plurality of openings provided on at least one of the vertical sides of the member such that a fluid may only exit the member in a horizontal direction so that bubbles generated do not directly contact the semiconductor wafers suspended at the center of the tank.

REFERENCES:
patent: 1016487 (1912-02-01), Freer
patent: 1923654 (1933-08-01), Andreasen
patent: 2383946 (1945-09-01), Tietig
patent: 3306792 (1967-02-01), Thurmel et al.
patent: 3745079 (1973-07-01), Cowles et al.
patent: 4251317 (1981-02-01), Foote
patent: 4840701 (1989-06-01), Stern
patent: 5082518 (1992-01-01), Molinaro
patent: 5346101 (1994-09-01), Hargis et al.
patent: 5464480 (1995-11-01), Matthews
patent: 5474616 (1995-12-01), Hayami et al.
patent: 5520205 (1996-05-01), Guldi et al.
patent: 5676281 (1997-10-01), Reier
patent: 5704981 (1998-01-01), Kawakami et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Fluid dispensing device for wet chemical process tank and method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Fluid dispensing device for wet chemical process tank and method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Fluid dispensing device for wet chemical process tank and method will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1946011

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.