Flip-chip semiconductor devise having an electrode pad covered w

Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Flip chip

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257 81, 257763, 257766, 257448, H01L 2348, H01L 2954, H01L 2960

Patent

active

055064515

ABSTRACT:
An N-InP buffer layer is deposited on an N.sup.+ -InP substrate, an InGaAs light-absorbing layer is deposited on the buffer layer, an N.sup.- -InP cap layer is deposited on the light-absorbing layer, and a P-type impurity region is formed in the light-absorbing layer and the cap layer. Next, a masking film is formed on the cap layer, and with this masking film serving as a mask, the cap layer, the light-absorbing layer, the buffer layer are etched, thus forming a P-type electrode forming region and an N-type electrode forming region. Next, an insulating film is provided for the periphery portion of the P-type impurity region of the cap layer. Electrode pads having a laminated structure is formed respectively on the P-type and N-type electrode forming regions, and a non-metal member is formed on the insulating film and on the surface, the periphery and the side surface of the electrode pad of the P-type electrode.

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