Flexural plate wave sensor

Etching a substrate: processes – Etching of semiconductor material to produce an article...

Reexamination Certificate

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C029S025350

Reexamination Certificate

active

07468138

ABSTRACT:
A method for manufacturing a flexural plate wave sensor, the method including the steps of depositing an etch-stop layer over a substrate, depositing a membrane layer over said etch stop layer, depositing a piezoelectric layer over said membrane layer, forming a comb pattern with drive teeth which span across an entire length of the piezoelectric layer on said piezoelectric layer, etching a cavity through the substrate, the cavity having substantially parallel interior walls, and removing a portion of the etch stop layer between the cavity and the membrane layer to expose a portion of the membrane layer.

REFERENCES:
patent: 5852337 (1998-12-01), Takeuchi et al.
patent: 2003/0066348 (2003-04-01), Cunningham

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