Etching a substrate: processes – Etching of semiconductor material to produce an article...
Reexamination Certificate
2006-07-31
2008-12-23
Olsen, Allan (Department: 1792)
Etching a substrate: processes
Etching of semiconductor material to produce an article...
C029S025350
Reexamination Certificate
active
07468138
ABSTRACT:
A method for manufacturing a flexural plate wave sensor, the method including the steps of depositing an etch-stop layer over a substrate, depositing a membrane layer over said etch stop layer, depositing a piezoelectric layer over said membrane layer, forming a comb pattern with drive teeth which span across an entire length of the piezoelectric layer on said piezoelectric layer, etching a cavity through the substrate, the cavity having substantially parallel interior walls, and removing a portion of the etch stop layer between the cavity and the membrane layer to expose a portion of the membrane layer.
REFERENCES:
patent: 5852337 (1998-12-01), Takeuchi et al.
patent: 2003/0066348 (2003-04-01), Cunningham
Cunningham Brian
Hildebrant Eric
Weinberg Marc S.
Iandiorio Teska & Coleman
Olsen Allan
The Charles Stark Draper Laboratory Inc.
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