Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2005-08-16
2005-08-16
Hamilton, Cynthia (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S306000, C430S944000, C430S945000, C430S286100, C430S287100
Reexamination Certificate
active
06929898
ABSTRACT:
A photosensitive element for use as a photopolymer printing plate comprising a support, a layer of a photopolymerizable material on the support, and an infrared ablation layer which is ablatable by infrared radiation and substantially opaque to actinic radiation on the photopolymerizable material. The infrared ablation layer comprises at least one infrared absorbing material, a radiation opaque material, and at least one binder which is substantially incompatible with low molecular weight materials in the photopolymerizable layer. The infrared ablation layer is tack-free or substantially tack-free on the photopolymerizable layer. The infrared ablation layer is ablatable from the surface of the photopolymerizable layer upon exposure to infrared laser radiation.
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Griffing, B. F., On Operational Two Level Photoresist Technology, Dec. 7-9, 1981, pp 562-565, IEEE, Conference: International Electron Devices Meeting, Washington, DC.
E. I. du Pont de Nemours and Company
Hamilton Cynthia
Magee Thomas H.
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