Flexible membrane for a polishing head and chemical...

Abrading – Machine – Rotary tool

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C451S285000, C451S041000, C451S290000, C451S398000, C279S003000

Reexamination Certificate

active

11044373

ABSTRACT:
A flexible membrane for a polishing head and a chemical mechanical polishing (CMP) apparatus having the same are provided. The flexible membrane for a polishing head includes a compressing plate having a first face and a second face opposite to the first face. The first face of the compressing plate holds a substrate with a vacuum provided thereto and compresses the substrate on a polishing pad. The second face of the compressing plate is combined with a supporter of the polishing head. The second face and the supporter define a space to which the vacuum for holding the substrate and a first pneumatic pressure for compressing the substrate are applied. A dividing member combined with the supporter is formed on the second face. The dividing member divides the space into at least two regions. A pneumatic pressure-introducing portion is formed at the dividing member. A second pneumatic pressure is provided to the compressing plate through the pneumatic pressure-introducing portion.

REFERENCES:
patent: 5851140 (1998-12-01), Barns et al.
patent: 5916015 (1999-06-01), Natalicio
patent: 5957751 (1999-09-01), Govzman et al.
patent: 6033292 (2000-03-01), Inaba
patent: 6036587 (2000-03-01), Tolles et al.
patent: 6050882 (2000-04-01), Chen
patent: 6273803 (2001-08-01), Wang et al.
patent: 6273804 (2001-08-01), Numoto
patent: 6277000 (2001-08-01), Gotcher
patent: 6277014 (2001-08-01), Chen et al.
patent: 6361420 (2002-03-01), Zuniga et al.
patent: 6447379 (2002-09-01), Gromko et al.
patent: 2002/0039879 (2002-04-01), Zuniga et al.
patent: 2002/0111122 (2002-08-01), Korovin et al.
patent: 2003-031531 (2003-01-01), None
patent: 1020020040529 (2002-05-01), None
patent: WO 01/74534 (2001-10-01), None
patent: WO 02/07931 (2002-01-01), None
European Patent Office Communication.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Flexible membrane for a polishing head and chemical... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Flexible membrane for a polishing head and chemical..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Flexible membrane for a polishing head and chemical... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3730263

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.