Etching a substrate: processes – Forming or treating mask used for its nonetching function
Reexamination Certificate
2005-08-09
2005-08-09
Norton, Nadine G. (Department: 1765)
Etching a substrate: processes
Forming or treating mask used for its nonetching function
C216S040000, C216S054000, C438S141000, C438S237000, C438S780000
Reexamination Certificate
active
06926840
ABSTRACT:
A method of mounting a deposition mask onto a flexible frame for use in vacuum deposition of material through a pealable deposition mask in forming an OLED, including the steps of providing a plate with the pealable deposition mask formed thereon; providing the flexible frame having border portions, such border portions defining a frame opening which corresponds to border portions on the pealable deposition mask; aligning and then securing the border portions of the flexible frame to the border portions of the pealable deposition mask and removing the flexible frame and secured pealable deposition mask from the plate; and mounting the flexible frame with the pealable deposition mask in a carrier which maintains planarity of the pealable deposition mask during subsequent vacuum deposition of material.
REFERENCES:
patent: 5661371 (1997-08-01), Salerno et al.
patent: 5945238 (1999-08-01), Huggins et al.
patent: 6146489 (2000-11-01), Wirth
patent: 6475287 (2002-11-01), Clark
patent: 6703172 (2004-03-01), Fujita et al.
patent: 6703328 (2004-03-01), Tanaka et al.
patent: 55091972 (1980-07-01), None
patent: 11243274 (1999-09-01), None
patent: WO99/54786 (1999-10-01), None
Eastman Kodak Company
Norton Nadine G.
Owens Raymond L.
Tran Binh X.
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