Flash process for stacking poly etching

Details Flash process for stacking poly etching Flash process for stacking poly etching

2005-09-13

2005-09-13

Fourson, George (Department: 2823)

Semiconductor device manufacturing: process

Chemical etching

Combined with coating step

C438S230000, C438S585000, C438S669000, C438S696000, C438S710000, C438S761000, C438S778000, C438S798000

Reexamination Certificate

active

06943119

ABSTRACT:
In accordance with the objectives of the invention a new Method and recipe is provided for etching of stacked layers of polysilicon. The invention provides for an added flash step after the conventional Overall Etch (OE).

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patent: 6586299 (2003-07-01), Tsai
patent: 2002/0173150 (2002-11-01), Kawai et al.
patent: 2004/0121545 (2004-06-01), Chen et al.

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