Flash memory and method for manufacturing the same

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257SE27086

Reexamination Certificate

active

07952133

ABSTRACT:
Provided are a flash memory and a method for manufacturing the same. The flash memory includes a semiconductor substrate having a device isolation region and an active region; a stacked gate on the semiconductor substrate; an insulation layer covering the semiconductor substrate and the stacked gate; a drain contact penetrating the insulation layer on one side of the stacked gate; and a source line penetrating the insulation layer on an opposite side of the stacked gate.

REFERENCES:
patent: 4597159 (1986-07-01), Usami et al.
patent: 5731239 (1998-03-01), Wong et al.
patent: 5776835 (1998-07-01), Yeh et al.
patent: 6004849 (1999-12-01), Gardner et al.
patent: 6211012 (2001-04-01), Lee et al.
patent: 6268624 (2001-07-01), Sobek et al.
patent: 6534818 (2003-03-01), Hsu
patent: 6706594 (2004-03-01), Hurley
patent: 6790729 (2004-09-01), Woo
patent: 2002-0055881 (2002-07-01), None
patent: 2002-0056141 (2002-07-01), None
Seung Uk Choi, Bong Gil Kim, Gi Jun Kim, and Gi Seok Kim; “Method for Fabricating Flash Memory Device”; Korean Patent Abstracts; Publication No. 1020020055881 A; Published on Jul. 10, 2002; Korean Intellectual Property Office, Republic of Korea.
Bong Gil Kim, Gi Jun Kim, Geun U Lee, Seong Gi Park; “Method of Fabricating Semiconductor Devices”; Korean Patent Abstracts; Publication No. 1020020056141 A; Published on Jul. 10, 2002; Korean Intellectual Property Office, Republic of Korea.
Korean Office Action dated Nov. 24, 2006; Korean Patent Application No. 10-2005-0106813; 2 Pgs.; Korean Intellectual Property Office, Republic of Korea.

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