First approximation for OPC significant speed-up

Details First approximation for OPC significant speed-up First approximation for OPC significant speed-up

2005-02-08

2005-02-08

Siek, Vuthe (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C716S030000, C430S005000

Reexamination Certificate

active

06854104

ABSTRACT:
An optical proximity correction system for local correction of an aerial image produced from a mask having transmissive portions and blocking portions collectively defining a target design includes an analyzer to match one or more segments of the target design to one or more typical case segments from a predetermined set of typical case segments; a controller, coupled to the analyzer, for approximating each of the one or more segments of the target design with matching typical case segments from the set of typical case segments to produce an adjusted aerial image. The method for optical proximity correction using local correction of an aerial image produced from a mask having transmissive portions and blocking portions collectively defining a target design, includes: a) analyzing the target design to produce one or more segments from the target design and to match the one or more segments to one or more typical case segments from a predetermined set of typical case segments; and b) approximating each of the one or more segments of the target design with the matching typical case segments from the set of typical case segments to produce an adjusted aerial image.

REFERENCES:
patent: 5441834 (1995-08-01), Takekuma et al.
patent: 6171731 (2001-01-01), Medvedeva et al.
patent: 6243855 (2001-06-01), Kobayashi et al.
patent: 6301697 (2001-10-01), Cobb
patent: 6453457 (2002-09-01), Pierrat et al.
patent: 6467076 (2002-10-01), Cobb
patent: 6516459 (2003-02-01), Sahouria
patent: 6539521 (2003-03-01), Pierrat et al.
patent: 6584609 (2003-06-01), Pierrat et al.
patent: 6625801 (2003-09-01), Pierrat et al.
patent: 6643616 (2003-11-01), Granik et al.
patent: 6653026 (2003-11-01), Pierrat et al.
patent: 20030110465 (2003-06-01), Zhang
patent: 20040019869 (2004-01-01), Zhang
patent: 20040060034 (2004-03-01), Cote et al.
Cobb et al., “Flows for model-based layout correction of mask proximity effects”, Proc. SPIE Int. Soc. Opt. Eng, vol. 5256, (95 (20003).*
Cobb et al., “New concepts in OPC”, Proc. SPIE Int. Soc. Opt. Eng., vol. 5377, 680 (2004).*
Beale et al., “Multiple stage optical proximity correction”, Proc. SPIE Int. Soc. Opt. Eng., vol. 5040 (2003).*
Harazaki et al., “High accurate optical proximity correction under the influences of lens aberration in 0.15 μm logic process”, Jul. 11-13, 2000, Microprocesses and Nanotechnology Conference, 2000 International , pp.: 14-15.□□□□.*
Schellenberg et al., “Adoption of OPC and the impact on design and layout”, Jun. 18-22, 2001, Design Automation Conference, 2001. Proceedings , pp.: 89-92.□□□□.

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