Fine fabrication process using radiation sensitive resist

Details Fine fabrication process using radiation sensitive resist Fine fabrication process using radiation sensitive resist

1981-08-03

1983-01-04

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

20415922, 430270, 430296, 430323, 526310, G03C 500

Patent

active

043672817

ABSTRACT:
A fine work process comprises forming a thin film made of a radiation sensitive polymer on a board; irradiating radiation; developing and etching the product. The radiation sensitive polymer comprises at least 10 wt. % of a polymer having repeat units: ##STR1## wherein R and R' respectively represent hydrogen atom or an alkyl group and n is an integer of number of substituent groups.

REFERENCES:
patent: 3890147 (1975-06-01), Monahan
patent: 4065414 (1977-12-01), Seita et al.
patent: 4208211 (1980-06-01), Bowden et al.
patent: 4286049 (1981-08-01), Imamura et al.
Itaya et al., Proceedings of the 19th Symposium and Semiconductors and Integrated Circuits Technology; Tokyo, Nov. 26, 1980, Abstract of #7, (p. 42) only.

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