Chemical apparatus and process disinfecting – deodorizing – preser – Analyzer – structured indicator – or manipulative laboratory... – Calorimeter
Reexamination Certificate
2007-04-10
2007-04-10
Warden, Jill (Department: 1743)
Chemical apparatus and process disinfecting, deodorizing, preser
Analyzer, structured indicator, or manipulative laboratory...
Calorimeter
C422S050000, C422S068100, C422S082050, C422S091000
Reexamination Certificate
active
10120480
ABSTRACT:
A device includes a first substrate having a channel formed on front and rear surfaces of the first substrate, and an information recording layer forming an optical recording medium on at least one of the front and rear surfaces of the first substrate.
REFERENCES:
patent: 5250263 (1993-10-01), Manz
patent: 5681484 (1997-10-01), Zanzucchi et al.
patent: 5755942 (1998-05-01), Zanzucchi et al.
patent: 5866345 (1999-02-01), Wilding et al.
patent: 6136592 (2000-10-01), Leighton
patent: 6167910 (2001-01-01), Chow
patent: 6210986 (2001-04-01), Arnold et al.
patent: 6645432 (2003-11-01), Anderson et al.
patent: 2002/0150503 (2002-10-01), Tanaka et al.
patent: 8-334505 (1996-12-01), None
patent: WO 97/21090 (1997-06-01), None
patent: WO 98/22625 (1998-05-01), None
patent: WO 99/64836 (1999-12-01), None
patent: WO 01/07506 (2001-02-01), None
patent: WO 01/70400 (2001-09-01), None
U.S. Appl. No. 10/547,677, filed Sep. 2, 2005, Kawai et al.
Futami Toru
Hayashi Toshinori
Katayama Koji
Kawai Akira
Nishizawa Keiichiro
Oblon & Spivak, McClelland, Maier & Neustadt P.C.
Siefke Samuel P.
Tosoh Corporation
Warden Jill
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