Filtering system for a semiconductor processing tool

Details Filtering system for a semiconductor processing tool Filtering system for a semiconductor processing tool

2011-04-12

2011-04-12

Lawrence, Frank M (Department: 1775)

Gas separation: processes

Solid sorption

Organic gas or liquid particle sorbed

C423S245100

Reexamination Certificate

active

07922791

ABSTRACT:
The present invention provides a filtering system for a semiconductor processing tool. In one embodiment, the filtering system is associated with the semiconductor processing tool. A system of the invention comprises a first and second filter layer in fluid communication with a gas flow path. The flow path is a gas stream comprising volatile silica containing compounds such as hexamethyldisiloxane and trimethylsilanol. The gas flow path passes through the first and second filter layer to fluidly communicate with the semiconductor processing tool. Preferably, the first filter layer of the filtering system is upstream along the gas flow path from the second filter layer. The medias of the first and second filter layers are selected and arranged based on given contaminant concentrations. The invention also provides a method for filtering gas containing hexamethyldisiloxane and trimethylsilanol in communication with a semiconductor processing tool, which employs a system comprising a first and second filter layer.

REFERENCES:
patent: 3019127 (1962-01-01), Czerwonka et al.
patent: 3409691 (1968-11-01), Small
patent: 3607706 (1971-09-01), Eisenmann et al.
patent: 3998988 (1976-12-01), Shimomai et al.
patent: RE29410 (1977-09-01), Yoshino
patent: 4055075 (1977-10-01), Allan et al.
patent: 4072793 (1978-02-01), Watanabe et al.
patent: 4135896 (1979-01-01), Parish et al.
patent: 4204011 (1980-05-01), Tanabe et al.
patent: 4224415 (1980-09-01), Meitzner et al.
patent: 4313832 (1982-02-01), Shimizu et al.
patent: 4322230 (1982-03-01), Schoen et al.
patent: 4629479 (1986-12-01), Cantoni
patent: 4760423 (1988-07-01), Holtje et al.
patent: 4808202 (1989-02-01), Nishikawa et al.
patent: 4852133 (1989-07-01), Ikeda et al.
patent: 4946480 (1990-08-01), Hauville
patent: 4981501 (1991-01-01), Von Blëucher et al.
patent: 5023654 (1991-06-01), Matsumoto et al.
patent: 5039321 (1991-08-01), Satoh et al.
patent: 5130743 (1992-07-01), Katoh et al.
patent: 5133864 (1992-07-01), Vaughn et al.
patent: 5143552 (1992-09-01), Moriyama
patent: 5166530 (1992-11-01), McCleary
patent: 5181819 (1993-01-01), Sakata et al.
patent: 5204055 (1993-04-01), Sachs et al.
patent: 5219464 (1993-06-01), Yamaga et al.
patent: 5290345 (1994-03-01), Osendorf et al.
patent: 5300604 (1994-04-01), Nasman et al.
patent: 5306321 (1994-04-01), Osendorf
patent: 5328758 (1994-07-01), Markell et al.
patent: 5340656 (1994-08-01), Sachs et al.
patent: 5387380 (1995-02-01), Cima et al.
patent: 5399377 (1995-03-01), Economy et al.
patent: 5430303 (1995-07-01), Matsumoto et al.
patent: 5434644 (1995-07-01), Kitano et al.
patent: 5459943 (1995-10-01), Tanahashi
patent: 5462485 (1995-10-01), Kinkead
patent: 5486410 (1996-01-01), Groeger et al.
patent: 5514196 (1996-05-01), Tanahashi et al.
patent: 5582865 (1996-12-01), Rezuke et al.
patent: 5605746 (1997-02-01), Groeger et al.
patent: 5607647 (1997-03-01), Kinkead
patent: 5616169 (1997-04-01), De Ruiter et al.
patent: 5626820 (1997-05-01), Kinkead et al.
patent: 5647356 (1997-07-01), Osendorf et al.
patent: 5675752 (1997-10-01), Scott et al.
patent: 5685895 (1997-11-01), Hagiwara et al.
patent: 5743927 (1998-04-01), Osendorf
patent: 5753345 (1998-05-01), Kuma et al.
patent: 5772738 (1998-06-01), Muraoka
patent: 5772884 (1998-06-01), Tanaka et al.
patent: 5783608 (1998-07-01), Sugo et al.
patent: 5807424 (1998-09-01), De Ruiter et al.
patent: 5833726 (1998-11-01), Kinkead et al.
patent: 5834114 (1998-11-01), Economy et al.
patent: 5856198 (1999-01-01), Joffe et al.
patent: 5890367 (1999-04-01), You et al.
patent: 5906429 (1999-05-01), Mori et al.
patent: 5928792 (1999-07-01), Moya
patent: 5944878 (1999-08-01), Lindhe
patent: 5964927 (1999-10-01), Graham et al.
patent: 6013821 (2000-01-01), Lopez
patent: 6033573 (2000-03-01), Toles et al.
patent: 6056805 (2000-05-01), Litwin et al.
patent: 6096267 (2000-08-01), Kishkovich et al.
patent: 6162281 (2000-12-01), Ammann et al.
patent: 6207460 (2001-03-01), Kishkovich et al.
patent: 6228135 (2001-05-01), Sugo et al.
patent: 6296806 (2001-10-01), Kishkovich et al.
patent: 6352579 (2002-03-01), Hirata et al.
patent: 6398846 (2002-06-01), Lorimer et al.
patent: 6447584 (2002-09-01), Kishkovich et al.
patent: 6533847 (2003-03-01), Seguin et al.
patent: 6610128 (2003-08-01), Kishkovich
patent: 6740147 (2004-05-01), Kishkovich et al.
patent: 6761753 (2004-07-01), Kishkovich et al.
patent: 6770736 (2004-08-01), Haftka et al.
patent: 6916360 (2005-07-01), Seguin et al.
patent: 7014693 (2006-03-01), Kishkovich et al.
patent: 7022164 (2006-04-01), Kishkovich et al.
patent: 7049382 (2006-05-01), Haftka et al.
patent: 7132011 (2006-11-01), Shellhammer et al.
patent: 7264648 (2007-09-01), Wetzel et al.
patent: 2002/0078828 (2002-06-01), Kishkovich et al.
patent: 2002/0110510 (2002-08-01), Seguin et al.
patent: 2004/0154470 (2004-08-01), Kishkovich et al.
patent: 2006/0078827 (2006-04-01), Hacker et al.
patent: 2006/0169139 (2006-08-01), Kishkovich et al.
patent: 4413606 (1995-11-01), None
patent: 19859788 (2000-03-01), None
patent: 0335034 (1989-10-01), None
patent: 0398847 (1990-11-01), None
patent: 0584030 (1994-02-01), None
patent: 1 022 043 (2000-07-01), None
patent: 1105203 (2004-01-01), None
patent: 03-038212 (1991-02-01), None
patent: 06-063333 (1994-03-01), None
patent: 06-198123 (1994-07-01), None
patent: 08-024534 (1996-01-01), None
patent: 08-168628 (1996-07-01), None
patent: 10-165730 (1998-06-01), None
patent: 10-165744 (1998-06-01), None
patent: 10-192624 (1998-07-01), None
patent: WO 00/07696 (2000-02-01), None
patent: WO 00/25896 (2000-05-01), None
patent: WO 01/85308 (2001-11-01), None
International Preliminary Examination Report for PCT/US99/19244, dated Sep. 11, 2000.
Notification of Transmittal of International Preliminary Examination Report from counterpart International Application No. PCT/US2001/14655, dated Oct. 9, 2002.
Written Opinion from counterpart International Application No. PCT/US2001/14655, dated Aug. 9, 2002.
Notification of Transmittal of International Search Report from counterpart International Application No. PCT/US1999/19244, dated Dec. 17, 1999.
Author Unknown, “Donaldson LITHOGUARD®-12 Chemical Contamination Filter System”,Donaldson Filtration Systems, 2 pages (Jun. 2004).
Donaldson LithoGuard Filtration Systems Brochure, pp. 1-4 (2001) (month of publication not available).
Kishkovich, O., et al., “An Accelerated Testing Technique for Evaluating Performance of Chemical Air Filters for DUV Photolithographic Equipment,”SPIE(Part of the SPIE Conference on Metrology, Inspection and Process Control for Microlithography XIII, Santa Clara, CA), 3677: 857-865 (Mar. 1999).
International Search Report for PCT/US2007/016011, dated Dec. 5, 2007.
International Preliminary Report on Patentability for PCT/US2007/016011, dated Oct. 10, 2008.
International Search Report for PCT/US2001/14655, dated Aug. 7, 2002.

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