Film thickness measuring apparatus, film thickness measuring met

Details Film thickness measuring apparatus, film thickness measuring met Film thickness measuring apparatus, film thickness measuring met

1995-09-14

1997-08-12

Turner, Samuel A.

Optics: measuring and testing

By dispersed light spectroscopy

Utilizing a spectrometer

G01B 902

Patent

active

056571232

ABSTRACT:
A light interference-type film thickness measuring mechanism 24 measures a film thickness by irradiating a light emitted from a light transmission portion on to the bottom surface of a wafer W held by a wafer holding head 8 and receives the reflected light and. A cleaning mechanism 26 includes a cleaning fluid tank 27 a top surface of which is opened and arranged in the vicinity of the bottom surface of the wafer; a light transmission portion 50 formed at the bottom portion 48 of the tank 27; a wafer cleaning nozzle 40 spraying the cleaning fluid on the measuring points at the bottom surface of the wafer; a light transmission portion cleaning nozzle 44 spraying the cleaning fluid on the light transmission portion 50 and cleaning fluid supply means for supplying cleaning fluid to these nozzles.

REFERENCES:
patent: 5413941 (1995-05-01), Koos et al.
patent: 5486129 (1996-01-01), Sandhu et al.
patent: 5502564 (1996-03-01), Ledger

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